B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...

BERLIN, GERMANY - SEPTEMBER 18: The logo of ASML hangs over an office building the company occupies near its production campus, where it inaugurated the expansion of ASML wafer production components ...

BERLIN, GERMANY - SEPTEMBER 18: The logo of ASML hangs over an office building the company occupies near its production campus, where it inaugurated the expansion of ASML wafer production components ...

Dutch exports to China dropped in March, implying that shipments from ASML Holding (NASDAQ:ASML) neared clearing a backlog of orders from China. ASML makes the most advanced machines used in chip ...

Substrate claims its method could reduce the cost of producing a cutting-edge wafer from $100,000 to around $10,000 by the end of the decade, with commercial production targeted for 2028, the ...