B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...
China is evading U.S. and Dutch restrictions on advanced chipmaking tools by retrofitting older ASML lithography machines ...