Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

There are no certainties anymore in lithography, but directed self-assembly does present some significant advantages that will carry through for at least several nodes. Directed self-assembly (DSA) ...

At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line ...

The Company's Top Engineers and Scientists to Present Novel Developments in Extreme Ultraviolet (EUV) Lithography and Complimentary Directed Self-Assembly (DSA) Approaches. Warren Montgomery Named ...

(Nanowerk News) Last week’s SPIE Advanced Lithography was a success in both quality of papers and numbers of attendees , with attendance at 2,230 and important progress reports on extreme ultraviolet ...

(Nanowerk News) Advanced simulation models and a computational framework for lithography-integrated directed self-assembly (DSA) of block copolymers will be developed within the European project ...

A new paper claims that directed self-assembly could be key to patterning lines below 10nm, but line-edge roughness and manufacturing challenges still present substantial barriers. Share on Facebook ...

Imec and Tokyo Electron (TEL) announce that they will accelerate their Directed Self-Assembly (DSA) activities at imec’s recent 300mm fab-compatible DSA process line. Over the past two years, both ...

GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti said today that its multi-partner programs, IDEAL and IMAGINE, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X ...

ALBANY, N.Y. & KYOTO, Japan--(BUSINESS WIRE)--Dainippon Screen Mfg. has confirmed our subsidiary company’s SOKUDO DUO 450mm coat/develop track system has been chosen by the Global 450mm Consortium ...