The semiconductor industry thrives on precision and innovation, as every nanometer can make the difference between groundbreaking performance and obsolescence. In this hyper-competitive landscape, ...

Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...

There are a few methods in dry etching, such as isotropic radial etching, reactive ion etching, sputter etching, and ion milling. The intricacies of each are beyond the scope of this article, and ...

Lam Research is a major vendor of semiconductor fabrication tools. Specifically, it is the market share leader in dry etch, a critical step in the chipmaking process where material is selectively ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Companies to Focus on Patterning for Leading-Edge Chips, Including Dry Resist EUV Lithography and Next-Generation Materials Lam, JSR agreement intended to drive the industry's transition to next-gen ...

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

Etching is a method employed during the fabrication of semiconductors to chemically remove layers from the surface of the wafer substrate. Etching is a crucial process, and each wafer is subject to ...

TOKYO, Sept 16, 2025 - (JCN Newswire) - - JSR Corporation, a leading technology company focused on material innovation and the parent company of Inpria Corporation, a metal oxide photoresist solution ...