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Semi-damascene integration approach enables achievement of 16nm pitch Ru lines with record-low resistance
At the 2025 IEEE International Interconnect Technology Conference (IITC), imec, a research and innovation hub in nanoelectronics and digital technologies, has presented Ru lines at 16nm pitch with ...
With decreasing dynamic random-access memory (DRAM) cell sizes, DRAM process development has become increasingly difficult. Bit-line (BL) sensing margins and refresh times have become problematic as ...
TrueSite TIâ„¢, the fourth generation of WuXiaâ„¢ cell line platform, leverages targeted integration technique to streamline clone screening and guarantees expression stability. The platform has achieved ...
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