A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

Nonthermal and thermal plasmas are used in the industrial, engineering, medical, and research industries. Plasma composition is an important parameter in any plasma process. Using optical emission ...

Deposition of many important materials such as semi-conductors is performed using energetic jets under low pressure conditions. In addition, materials that have been deposited, such as silicon, are ...

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...